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Dual-channel technology with Cap-free single metal gate for high performance CMOS in gate-first and gate-last integration
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1 since deposited on 2021-10-19
Acq. date: 2025-12-08
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2033 since deposited on 2021-10-19
Acq. date: 2025-12-08
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1 since deposited on 2021-10-19
Acq. date: 2025-12-08
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2033 since deposited on 2021-10-19
Acq. date: 2025-12-08
Citations