Browsing by Author "Tedeschi, Len"
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Publication Cluster optimization to improve total CD control as an enabler for double patterning
Proceedings paper2008, Litography ASIA, 4/11/2008, p.714023Publication Cluster optimization to improve total CD control as an enabler for double patterning
Proceedings paper2008, 5th International Symposium on Immersion Lithography Extensions, 22/09/2008Publication Track optimization and control for 32nm node double patterning and beyond
Proceedings paper2009, Metrology, Inspection, and Process Control for Microlithography XXIII, 22/02/2009, p.727236