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Browsing by Author "Temst, Kristiaan"

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    A growth and morphology study of organic vapor phase deposited perylene diimide thin films for transistor applications

    Vasseur, Karolien
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    Rolin, Cedric  
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    Vandezande, Stijn
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    Temst, Kristiaan  
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    Froyen, Ludo
    Journal article
    2010, Journal of Physical Chemistry C, (114) 6, p.2730-2737
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    ALD on high mobility channels: engineering the proper gate stack passivation

    Sioncke, Sonja
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    Lin, Dennis  
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    Brammertz, Guy  
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    Delabie, Annelies  
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    Conard, Thierry  
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    Caymax, Matty  
    Meeting abstract
    2010, 218th ECS Meeting Symposium ' Atomic Layer Deposition Applications 6', 10/10/2010, p.1401
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    Assessment of Ge1-xSnx alloys for strained Ge CMOS devices

    Takeuchi, Shotaro
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    Shimura, Yosuke
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    Nishimura, Tsuyoshi
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    Vincent, Benjamin  
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    Eneman, Geert  
    Proceedings paper
    2010-10, SiGe, Ge, and Related Compounds: Materials, Processing, and Devices, 10/10/2010, p.529-535
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    Atomic layer deposition of high-k dielectrics on sulphur-passivated germanium

    Sioncke, Sonja
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    Lin, Dennis  
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    Nyns, Laura  
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    Brammertz, Guy  
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    Delabie, Annelies  
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    Conard, Thierry  
    Journal article
    2011, Journal of the Electrochemical Society, (158) 7, p.H687-H692
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    Atomistic Modeling of Spin and Electron Dynamics in Two-Dimensional Magnets Switched by Two-Dimensional Topological Insulators

    Tiwari, Sabyasachi  
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    Van de Put, Maarten  
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    Temst, Kristiaan
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    Vandeberghe, William G.
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    Soree, Bart  
    Journal article
    2023, PHYSICAL REVIEW APPLIED, (19) 1, p.Art. 014040
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    BiFeO3 thin films via aqueous solution depostion: a study of phase formation and stabilization

    Pavlovic, Nikolina
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    D'Haen, Jan  
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    Modarresi, Hiwa
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    Riskin, Alexander
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    De Dobbelaere, Christopher
    Journal article
    2015, Journal of Materials Science, 50, p.4463-4476
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    Correlating the polymorphism of titanyl phthalocyanine thin films with solar cell performance

    Vasseur, Karolien
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    Rand, Barry
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    Cheyns, David  
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    Temst, Kristiaan  
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    Froyen, Ludo
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    Heremans, Paul  
    Journal article
    2012, Journal of Physical Chemistry Letters, 3, p.2395-2400
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    Correlation between morphology and electrical characteristics of organic vapor phase deposited PTCDI-C13 thin film transistors

    Vasseur, Karolien
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    Rolin, Cedric  
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    Vandezande, Stijn
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    Temst, Kristiaan  
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    Froyen, Ludo
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    Genoe, Jan  
    Proceedings paper
    2010, International Conference on Organic Electronics - ICOE, 22/06/2010
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    Crystalline properties and strain relaxation mechanism of CVD grown GeSn

    Gencarelli, Federica
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    Vincent, Benjamin  
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    Demeulemeester, Jelle
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    Vantomme, Andre  
    Journal article
    2013, ECS Journal of Solid State Science and Technology, (2) 4, p.P134-P137
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    Crystalline properties and strain relaxation mechanism of CVD grown GeSn

    Gencarelli, Federica
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    Vincent, Benjamin  
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    Demeulemeester, Jelle
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    Vantomme, Andre  
    Proceedings paper
    2012, SiGe, Ge, and Related Compunds 5: Materials, Processing, and Devices, 7/10/2012, p.875-883
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    Crystalline properties and strain relaxation mechanism of CVD grown GeSn

    Gencarelli, Federica
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    Vincent, Benjamin  
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    Kumar, Arul
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    Demeulemeester, Jelle
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    Vantomme, Andre  
    Meeting abstract
    2012, ECS Fall Meeting Symposium: SiGe, Ge, and Related Compounds: Materials, Processing, and Devices, 7/10/2012, p.3213
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    Development of the Ni(001) surface morphology upon low energy Ar+ ion bombardment

    Skeren, Tomas
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    Vandervorst, Wilfried  
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    Vantomme, Andre  
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    Temst, Kristiaan  
    Meeting abstract
    2009, 16th International Summer School on Vacuum, Electron and Ion Technologies, 28/09/2009
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    Electronic voltage control of magnetic anisotropy at room temperature in high-k SrTiO3\Co\Pt trilayer

    Vermeulen, Bart  
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    Couet, Sebastien  
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    Popovici, Mihaela Ioana  
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    Radu, Iuliana  
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    Van de Vondel, Joris
    Journal article
    2020, Physical Review Materials, (4) 11, p.114415
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    Elemental redistribution of Pt and Pd in nickel silicides: a comparative study

    Schrauwen, A.
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    Demeulemeester, Jelle
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    Kumar, Arul
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    De Schutter, B.
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    Vandervorst, Wilfried  
    Meeting abstract
    2012, Materials for Advanced Metallization - MAM, 11/03/2012, p.O4-4
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    Enabling the high-performance InGaAs/Ge CMOS: a common gate stack solution

    Lin, Dennis  
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    Brammertz, Guy  
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    Sioncke, Sonja
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    Fleischmann, Claudia  
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    Delabie, Annelies  
    Proceedings paper
    2009, IEEE International Electron Device Meeting - IEDM, 7/12/2009, p.327-330
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    Enhanced SOT Efficiency in Pt/Co Systems with a NiO Interlayer for SOT-MRAM

    Wijshoff, Michelle  
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    Carpenter, Robert  
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    Talmelli, Giacomo  
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    Couet, Sebastien  
    Proceedings paper
    2024, IEEE International Magnetics Conference (INTERMAG), MAY 05-10, 2024
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    Epitaxial growth of magnetron sputtered NiAl on Ge mediated by native GeOx

    Ben Chroud, Mohamed  
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    Korytov, Maxim  
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    Soulie, Jean-Philippe  
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    Adelmann, Christoph  
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    Swerts, Johan  
    Journal article
    2024, JOURNAL OF PHYSICS D-APPLIED PHYSICS, (57) 13, p.Art. 135309
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    EXAFS investigation of Sn local environment in strained and relaxed epitaxial Ge1xSnx films

    Gencarelli, Federica
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    Grandjean, Didier
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    Shimura, Yosuke
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    Vincent, Benjamin  
    Oral presentation
    2015, Synchrotron and Neutron Workshop - SyNeW
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    EXAFS study of Sn local environment in strained and relaxed CVD grown epitaxial GeSn films

    Gencarelli, Federica
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    Grandjean, Didier
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    Shimura, Yosuke
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    Vincent, Benjamin  
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    Vantomme, Andre  
    Proceedings paper
    2013, 8th International conference on Silicon Epitaxy and Heterostructures - ICSI-8, 2/06/2013, p.59-60
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    Extended X-ray absorption fine structure investigation of Sn local environment in strained and relaxed epitaxial Ge1-xSnx films

    Gencarelli, Federica
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    Grandjean, Didier
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    Shimura, Yosuke
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    Vincent, Benjamin  
    Journal article
    2015, Journal of Applied Physics, (117) 9, p.95702
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