Browsing by Author "Toublan, O."

Now showing 1 - 3 of 3

Application of a new approach to optical proximity correction

Rosenbusch, A.
;
Hourd, A.
;
Juffermans, Casper
;
Kirsch, H.
;
Lalanne, F.
;
Maurer, W.
;
Romeo, C.
Proceedings paper
1999, Optical Microlithography XII, 17/03/1999, p.639-647
New approach to optical proximity correction

Rosenbusch, A.
;
Hourd, A.
;
Juffermans, C.
;
Kirsch, H.
;
Lalanne, F.
;
Maurer, W.
;
Romeo, C.
;
Ronse, Kurt
Proceedings paper
1998, 18th Annual Bacus Symposium on Photomask Technology and Management, 16/09/1998, p.585-593
(Sub-) 100-nm gate patterning using 248-nm alternating PSM

Vandenberghe, Geert
;
Jaenen, Patrick
;
Jonckheere, Rik
;
Ronse, Kurt
;
Toublan, O.
Proceedings paper
2001, Photomask and Next-Generation Lithography Mask Technology VIII, 25/04/2001, p.61-70