Browsing by Author "Toublan, Olivier"

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LENS (Lithography Enhancement towards Nano Scale) a european project to support double exposure and double patterning technology development

Cantu, Pietro
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Baldi, Livio
;
Piacentini, Paolo
;
Sytsma, Joost
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Le Gratiet, Bernard
Proceedings paper
2010, Optical Microlithography XXIII, 21/02/2010, p.764022
LENS - Lithography enhancement towards nano scale

Cantu, Pietro
;
Baldi, Livio
;
De Simone, Danilo
;
Piacentini, Paolo
;
Fliervoet, Timon
Oral presentation
2010, European Nanoelectronics Forum
Process, design and optical proximity correction requirements for the 65nm device generation

Lucas, Kevin
;
Montgomery, Patrick
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Litt, Lloyd C.
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Conley, Will
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Postnikov, Sergei V.
;
Wu, Wei
Proceedings paper
2003, Optical Microlithography XVI, 23/02/2003, p.408-419