Publication:

Process, design and optical proximity correction requirements for the 65nm device generation

Date

2003
Proceedings Paper
Simple item page Full metadata Statistics
Loading...
Thumbnail Image

Files

7605.pdf 1.45 MB

Author(s)

Lucas, Kevin
;
Montgomery, Patrick
;
Litt, Lloyd C.
;
Conley, Will
;
Postnikov, Sergei V.
;
Wu, Wei
;
Yuan, Chi-Min
;
Olivares, Marc
;
Strozewski, Kirk
;
Carter, Russell L.
;
Vasek, James
;
Smith, David
;
Fanucchi, Eric L.
;
Wiaux, Vincent  
;
Vandenberghe, Geert  
;
Toublan, Olivier
;
Verhappen, Arjan
;
Kuijten, Jan P.
;
van Wingerden, Johannes
;
Kasprowicz, Bryan S.
;
Tracy, Jeffrey W.
;
Progler, Christopher J.
;
Shiro, Eugene
;
Topouzov, Igor
;
Wimmer, Karl
;
Roman, Bernard J.

Journal

Abstract

Description

Statistics

Views

2010 since deposited on 2021-10-15
Acq. date: 2026-03-17

Citations

Statistics

Views

2010 since deposited on 2021-10-15
Acq. date: 2026-03-17

Citations