Publication:

Process, design and optical proximity correction requirements for the 65nm device generation

Date

2003
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorLucas, Kevin
dc.contributor.authorMontgomery, Patrick
dc.contributor.authorLitt, Lloyd C.
dc.contributor.authorConley, Will
dc.contributor.authorPostnikov, Sergei V.
dc.contributor.authorWu, Wei
dc.contributor.authorYuan, Chi-Min
dc.contributor.authorOlivares, Marc
dc.contributor.authorStrozewski, Kirk
dc.contributor.authorCarter, Russell L.
dc.contributor.authorVasek, James
dc.contributor.authorSmith, David
dc.contributor.authorFanucchi, Eric L.
dc.contributor.authorWiaux, Vincent
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorToublan, Olivier
dc.contributor.authorVerhappen, Arjan
dc.contributor.authorKuijten, Jan P.
dc.contributor.authorvan Wingerden, Johannes
dc.contributor.authorKasprowicz, Bryan S.
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorVandenberghe, Geert
dc.date.accessioned2021-10-15T05:29:44Z
dc.date.available2021-10-15T05:29:44Z
dc.date.embargo9999-12-31
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7832
dc.source.beginpage408
dc.source.conferenceOptical Microlithography XVI
dc.source.conferencedate23/02/2003
dc.source.conferencelocationSanta Clara, CA USA
dc.source.endpage419
dc.title

Process, design and optical proximity correction requirements for the 65nm device generation

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
7605.pdf
Size:
1.45 MB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions