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LENS (Lithography Enhancement towards Nano Scale) a european project to support double exposure and double patterning technology development
Publication:
LENS (Lithography Enhancement towards Nano Scale) a european project to support double exposure and double patterning technology development
Date
2010
Proceedings Paper
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20401.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Cantu, Pietro
;
Baldi, Livio
;
Piacentini, Paolo
;
Sytsma, Joost
;
Le Gratiet, Bernard
;
Gaugiran, Stephanie
;
Wong, Patrick
;
Miyashita, Hiroyuki
;
Atzei, Luisa Rita
;
Buch, Xavier
;
Verkleij, Dick
;
Toublan, Olivier
;
Perez-Murano, Francesco
;
Mecerreyes, David
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1903
since deposited on 2021-10-18
Acq. date: 2025-10-27
Citations
Metrics
Views
1903
since deposited on 2021-10-18
Acq. date: 2025-10-27
Citations