Publication:

LENS (Lithography Enhancement towards Nano Scale) a european project to support double exposure and double patterning technology development

Date

2010
Proceedings Paper
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dc.contributor.authorCantu, Pietro
dc.contributor.authorBaldi, Livio
dc.contributor.authorPiacentini, Paolo
dc.contributor.authorSytsma, Joost
dc.contributor.authorLe Gratiet, Bernard
dc.contributor.authorGaugiran, Stephanie
dc.contributor.authorWong, Patrick
dc.contributor.authorMiyashita, Hiroyuki
dc.contributor.authorAtzei, Luisa Rita
dc.contributor.authorBuch, Xavier
dc.contributor.authorVerkleij, Dick
dc.contributor.authorToublan, Olivier
dc.contributor.authorPerez-Murano, Francesco
dc.contributor.authorMecerreyes, David
dc.contributor.imecauthorWong, Patrick
dc.contributor.orcidimecWong, Patrick::0000-0003-3605-9680
dc.date.accessioned2021-10-18T15:29:06Z
dc.date.available2021-10-18T15:29:06Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16822
dc.source.beginpage764022
dc.source.conferenceOptical Microlithography XXIII
dc.source.conferencedate21/02/2010
dc.source.conferencelocationSan Jose, CA USA
dc.title

LENS (Lithography Enhancement towards Nano Scale) a european project to support double exposure and double patterning technology development

dc.typeProceedings paper
dspace.entity.typePublication
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