Browsing by Author "Tsuji, Naoto"
Now showing 1 - 3 of 3
- Results Per Page
- Sort Options
Publication Characterization and optimization of porogen based PECVD deposited extreme low-k materials as a function of UV-cure time
Journal article2007, Surface and Coatings Technology, (201) 22_23, p.9264-9268Publication Deposition and characterization of porogen based PECVD deposited and UV-cured extreme low-k materials
Proceedings paper2007, 16th European Conference on Chemical Vapor Deposition - EUROCVD, 16/09/2007Publication Improved low-k dielectric properties using He/H2 plasma for resist removal
;Urbanowicz, Adam ;Shamiryan, Denis ;Marsik, Premysl ;Travaly, YoussefJonas, AlainProceedings paper2009, Advanced Metallization Conference 2008 (AMC 2008), 22/09/2008, p.593-598