Browsing by Author "Van Meirhaeghe, R."
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Publication A ballistic electron-emission microscopy (BEEM)-investigation of the effects of chemical pretreatments on III-V semiconductor Schottky barriers
Publication CoSi2 formation using a Ti capping layer - influence of processing conditions on CoSi2 nucleation
Oral presentation2001, Symposium K of the MRS Spring Meeting: Gate Stack and Silicide Issues in Si Processing II; 16-20 April 2001; San Francisco, CA,Publication Electrical transport in (100)CoSi2/Si contacts
Journal article1995, J. Appl. Phys., (77) 6, p.2525-36Publication The influence of Ti capping layers on CoSi2 formation
Oral presentation1999, European Workshop Materials for Advanced Metallization; March 8-10, 1999; Oostende, Belgium.Publication The influence of Ti capping layers on CoSi2 formation in the presence of interfacial oxide
Proceedings paper1999, Advanced Interconnects and Contacts, 05/04/1999, p.139-144Publication The influence of TiN on the thermal stability of CoSi2
Oral presentation2001, Symposium K of the MRS Spring Meeting: Gate Stack and Silicide Issues in Si Processing II; 16-20 April 2001; San Francisco, CA,