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The influence of Ti capping layers on CoSi2 formation in the presence of interfacial oxide
Publication:
The influence of Ti capping layers on CoSi2 formation in the presence of interfacial oxide
Date
1999
Proceedings Paper
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3377.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Detavernier, C.
;
Alves Donaton, Ricardo
;
Maex, Karen
;
Jin, S.
;
Bender, Hugo
;
Van Meirhaeghe, R.
;
Cardon, F.
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1990
since deposited on 2021-10-06
Acq. date: 2025-10-24
Citations
Metrics
Views
1990
since deposited on 2021-10-06
Acq. date: 2025-10-24
Citations