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A ballistic electron-emission microscopy (BEEM)-investigation of the effects of chemical pretreatments on III-V semiconductor Schottky barriers
Publication:
A ballistic electron-emission microscopy (BEEM)-investigation of the effects of chemical pretreatments on III-V semiconductor Schottky barriers
Date
1998
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Van Meirhaeghe, R.
;
Vanalme, G.
;
Goubert, L.
;
Cardon, F.
;
Van Daele, P.
Journal
Abstract
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1992
since deposited on 2021-10-01
Acq. date: 2025-10-22
Citations
Metrics
Views
1992
since deposited on 2021-10-01
Acq. date: 2025-10-22
Citations