Browsing by Author "Van Oosten, Anton"
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Publication Alternative EUV mask technology for mask 3D effect compensation
Proceedings paper2014, International Symposium on Extreme Ultraviolet Lithography - EUVL, 27/10/2014Publication Alternative EUV mask technology to compensate for mask 3D effects
Proceedings paper2015, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII, 20/04/2015, p.96580IPublication Experimental validation of novel EUV mask technology to reduce mask 3D effects
Proceedings paper2015, 31st European Mask and Lithography Conference, 22/06/2015, p.966109Publication Experimental validation of novel mask technology to reduce mask 3D effects
Proceedings paper2015, Photomask Technology 2015, 29/09/2015, p.96350Z