Browsing by Author "Van de Kruijs, Robbert"
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Publication Characterization of optical material properties for alternative EUV mask absorber materials
Proceedings paper2016, European Mask and Lithography Conference - EMLC, 21/06/2016Publication Optical constants for EUV scatterometry
Proceedings paper2021, Modeling Aspects in Optical Metrology VII, 21/06/2021, p.117830MPublication Reducing EUV mask 3D effects by alternative metal absorbers
; ; ; ; Evanschitzky, PeterJournal article2017, Journal of Micro/Nanolithography MEMS and MOEMS, (16) 4, p.41002