Browsing by Author "Vanoppen, Peter"
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Publication 3D features measurement using YieldStar, an angle resolved polarized scatterometer
Proceedings paper2011, Metrology, Inspection, and Process Control XXV, 27/02/2011, p.79712EPublication 3D features measurement using Yieldstar, an angle resolved polarized scatterometer
Proceedings paper2011, Optical Fabrication, Testing and Metrology IV, 5/09/2011, p.8160QPublication A single metrology tool solution for complete exposure tool setup
; ; ; ; ;Cheng, ShauneeProceedings paper2010, Metrology, Inspection and Process Control for Microlithography XXIV, 21/02/2010, p.763809Publication Achieving optimum diffraction based overlay performance
Proceedings paper2010, Metrology, Inspection and Process Control for Microlithography XXIV, 21/02/2010, p.76382BPublication Focus and dose de-convolution technique for improved CD-control of immersion clusters
; ; ; ; ;Cheng, ShauneeProceedings paper2010, Metrology, Inspection and Process Control for Microlithography XXIV, 21/02/2010, p.763808Publication KrF lithography for 130nm
;Finders, Jo ;van Schoot, J. ;Vanoppen, Peter ;Dusa, M. ;Socha, B.; Proceedings paper2000, Optical Microlithography XIII, 1/03/2000, p.192-205