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Browsing by Author "Vanoppen, Peter"

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    3D features measurement using YieldStar, an angle resolved polarized scatterometer

    Charley, Anne-Laure  
    ;
    Leray, Philippe  
    ;
    D'have, Koen  
    ;
    Cheng, Shaunee
    ;
    Hinnen, Paul
    ;
    Li, Fahong
    Proceedings paper
    2011, Metrology, Inspection, and Process Control XXV, 27/02/2011, p.79712E
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    3D features measurement using Yieldstar, an angle resolved polarized scatterometer

    Charley, Anne-Laure  
    ;
    Leray, Philippe  
    ;
    D'have, Koen  
    ;
    Cheng, Shaunee
    ;
    Hinnen, P.
    ;
    Li, Fahong
    Proceedings paper
    2011, Optical Fabrication, Testing and Metrology IV, 5/09/2011, p.8160Q
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    A single metrology tool solution for complete exposure tool setup

    Laidler, David  
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    D'have, Koen  
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    Charley, Anne-Laure  
    ;
    Leray, Philippe  
    ;
    Cheng, Shaunee
    ;
    Dusa, Mircea  
    Proceedings paper
    2010, Metrology, Inspection and Process Control for Microlithography XXIV, 21/02/2010, p.763809
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    Achieving optimum diffraction based overlay performance

    Leray, Philippe  
    ;
    Laidler, David  
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    Cheng, Shaunee
    ;
    Coogans, Martyn
    ;
    Fuchs, Andreas
    Proceedings paper
    2010, Metrology, Inspection and Process Control for Microlithography XXIV, 21/02/2010, p.76382B
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    Focus and dose de-convolution technique for improved CD-control of immersion clusters

    Charley, Anne-Laure  
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    D'have, Koen  
    ;
    Leray, Philippe  
    ;
    Laidler, David  
    ;
    Cheng, Shaunee
    ;
    Dusa, Mircea  
    Proceedings paper
    2010, Metrology, Inspection and Process Control for Microlithography XXIV, 21/02/2010, p.763808
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    KrF lithography for 130nm

    Finders, Jo
    ;
    van Schoot, J.
    ;
    Vanoppen, Peter
    ;
    Dusa, M.
    ;
    Socha, B.
    ;
    Vandenberghe, Geert  
    ;
    Ronse, Kurt  
    Proceedings paper
    2000, Optical Microlithography XIII, 1/03/2000, p.192-205

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