Browsing by Author "Waldfried, C."
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Publication Evaluation of the degree of damage after different conditions of He/H2 dry strip plasma on silica-based porous low-k materials - compatiblity study with chemical solutions
Proceedings paper2005, Cleaning Technology in Semiconductor Devices Manufacturing IX, 16/10/2005, p.319-326Publication Role of dielectric and barrier integrity in reliability of sub-100nm copper low-k interconnect
Proceedings paper2005, 43rd Annual IEEE International Reliability Physics Symposium Proceedings, 17/04/2005, p.495-500