Browsing by Author "Wallinga, H."
Now showing 1 - 5 of 5
- Results Per Page
- Sort Options
Publication Breakdown and recovery of thin gate oxides
Proceedings paper2000, Proceedings of the 30th European Solid-State Device Research Conference - ESSDERC, 11/09/2000, p.116-119Publication Breakdown and recovery of thin gate oxides
Journal article2000, Japanese Journal of Applied Physics. Part 2: Letters, (39) 6B, p.L582-L584Publication Current-voltage characteristics of gate oxides after hard breakdown
Proceedings paper2001, Extended Abstracts of the 2001 International Conference on Solid State Devices and Materials - SSDM;, p.212-213Publication Modelling of crystal originated particles and their impact on gate oxide integrity
Proceedings paper2002, Semiconductor Silicon 2002. Proceedings of the 9th International Symposium on Silicon Materials Science and Technology, 12/05/2002, p.528-539Publication Numerical analysis of electromigration in thin film VLSI interconnections
;Petrescu, Violeta ;Mouthaan, T. ;Schoenmaker, Wim ;Angelescu, Serban ;Vissarion, R.Dima, G.Proceedings paper1995, 18th International Semiconductor Conference. CAS'95 Proceedings, 10/10/1995, p.327-30