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Browsing by Author "Watanabe, Kenji"

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    2D-3D integration of hexagonal boron nitride and a high-kappa dielectric for ultrafast graphene-based electro-absorption modulators

    Agarwal, Hitesh
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    Terres, Bernat
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    Orsini, Lorenzo
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    Montanaro, Alberto
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    Sorianello, Vito
    Journal article
    2021, NATURE COMMUNICATIONS, (12) 1, p.1070
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    A practical application of multiple parameters profile characterization (MPPC) using CD-SEM on production wafers using Hyper-NA lithography

    Ishimoto, Toru
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    Sekiguchi, Kohei
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    Hasegawa, Norio
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    Watanabe, Kenji
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    Laidler, David  
    Proceedings paper
    2009, Metrology, Inspection and Process Control for Microlithography XXIII, 22/02/2009, p.72722E
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    Advanced CD-SEM metrology to improve total process control performance for hyper-NA lithography

    Osaki, Mayuka
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    Tanaka, Maki
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    Shishido, Chie
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    Ishimoto, Toru
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    Hasegawa, Norio
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    Sekiguchi, Kohei
    Proceedings paper
    2008, Metrology, Inspection, and Process Control for Microlithography XXII, 24/02/2008, p.69221B
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    Asymmetric photoelectric effect: Auger-assisted hot hole photocurrents in transition metal dichalcogenides

    Sushko, Andrey
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    De Greve, Kristiaan  
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    Phillips, Madeleine
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    Urbaszek, Bernhard
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    Joe, Andrew Y.
    Journal article
    2021, NANOPHOTONICS, (10) 1, p.105-113
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    Correlating Carrier Localization to Optoelectronic Behavior of Monolayer MoS2

    Singha, Arup
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    Aparna, P
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    Paul, Agniva
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    Shetty, Sanjitha K.
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    Watanabe, Kenji
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    Taniguchi, Takashi
    Journal article
    2025, ACS APPLIED MATERIALS & INTERFACES, (17) 31, p.44816-44824
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    Electrically controlled emission from singlet and triplet exciton species in atomically thin light-emitting diodes

    Joe, Andrew Y.
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    Jauregui, Luis A.
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    Pistunova, Kateryna
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    Valdivia, Andres M. Mier
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    Lu, Zhengguang
    Journal article
    2021, PHYSICAL REVIEW B, (103) 16, p.L161411
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    Excitons in a reconstructed moire potential in twisted WSe2/WSe2 homobilayers

    Andersen, Trond, I
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    Scuri, Giovanni
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    Sushko, Andrey
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    De Greve, Kristiaan  
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    Sung, Jiho
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    Zhou, You
    Journal article
    2021, NATURE MATERIALS, (20) 4, p.480-+
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    MuGFET Observation and CD measurement by using CD-SEM

    Maeda, Tatsuya
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    Tanaka, Maki
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    Isawa, Miki
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    Watanabe, Kenji
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    Hasegawa, Norio
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    Sekiguchi, Kohei
    Proceedings paper
    2008-02, Metrology, Inspection, and Process Control for Microlithography XXII, 25/02/2008, p.69222P
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    Use of the indirect photoluminescence peak as an optical probe of interface defectivity in MoS2

    Leonhardt, Alessandra  
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    Lockhart de la Rosa, Cesar Javier  
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    Nuytten, Thomas  
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    Banszerus, Luca
    Journal article
    2020, Advanced Materials Interfaces, (7) 18, p.2000413
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    Validation of CD-SEM etching residue evaluation technique for MuGFET structures

    Isawa, Miki
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    Tanaka, Maki
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    Maeda, Tatsuya
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    Watanabe, Kenji
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    Vandeweyer, Tom  
    ;
    Collaert, Nadine  
    Proceedings paper
    2009, Metrology, Inspection and Process Control for Microlithography XXIII, 22/02/2009, p.72720Q

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