Browsing by Author "Westlinder, J."
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Publication On the thermal stability of atomic layer deposited TiN as gate electrode in MOS devices
Journal article2003, IEEE Electron Device Letters, (24) 9, p.550-552Publication On the thermal stability of Atomic Layer Deposition (ALD) TiN as gate electrode in MOS devices
;Westlinder, J. ;Schram, T. ;Pantisano, Luigi ;Cartier, Eduard ;Kerber, AndreasLujan, GuilhermeOral presentation2002, 33rd IEEE Semiconductor Interface Specialists Conference - SISC