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Browsing by Author "Westlinder, J."

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    On the thermal stability of atomic layer deposited TiN as gate electrode in MOS devices

    Westlinder, J.
    ;
    Schram, Tom  
    ;
    Pantisano, Luigi
    ;
    Cartier, Eduard
    ;
    Kerber, Andreas
    Journal article
    2003, IEEE Electron Device Letters, (24) 9, p.550-552
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    On the thermal stability of Atomic Layer Deposition (ALD) TiN as gate electrode in MOS devices

    Westlinder, J.
    ;
    Schram, T.
    ;
    Pantisano, Luigi
    ;
    Cartier, Eduard
    ;
    Kerber, Andreas
    ;
    Lujan, Guilherme
    Oral presentation
    2002, 33rd IEEE Semiconductor Interface Specialists Conference - SISC

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