Browsing by Author "Wimmer, Karl"

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Model-based design improvements for the 100nm lithography generation

Lucas, Kevin
;
Postnikov, Sergei
;
Patterson, Kyle
;
Yuan, Min-Chi
;
Thomas, Carla
;
Thompson, Matt
Proceedings paper
2002, Optical Microlithograhy XV, 5/03/2002, p.215-226
Process, design and optical proximity correction requirements for the 65nm device generation

Lucas, Kevin
;
Montgomery, Patrick
;
Litt, Lloyd C.
;
Conley, Will
;
Postnikov, Sergei V.
;
Wu, Wei
Proceedings paper
2003, Optical Microlithography XVI, 23/02/2003, p.408-419