Browsing by Author "Wong, Alfred"
Now showing 1 - 5 of 5
- Results Per Page
- Sort Options
Publication Feature biasing versus feature-assisted lithography. A comparison of proximity correction methods for 0.5*(l/NA) lithography
Proceedings paper1995, Optical Laser Microlithography VIII, 22/02/1995, p.150-170Publication Massively parallel electromagnetic simulation for photolithographic applications
Publication Optical proximity correction for 0.3 μm i-line lithography
Journal article1996, Microelectronic Engineering, 30, p.141-144Publication Optical proximity correction: mask pattern-generation challenges
Journal article1996, Microelectronic Engineering, 30, p.115-118Publication Rigorous three-dimensional time-domain finite-difference electromagnetic simulation for photolithographic applications