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Browsing by Author "Wu, Y."

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    A theoretical and experimental study of damage-free BEOL cleaning with megasonic agitation

    Lauerhaas, Jeff
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    Wu, Y.
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    Bran, M.
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    Fraser, B.
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    Brause, E.
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    Nicolosi, T.
    Proceedings paper
    2003, Ultra Clean Processing of Silicon Surfaces 2002 - UCPSS, 16/09/2002, p.151-157
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    Bifacial Four-Terminal Perovskite/Silicon Tandem Solar Cells and Modules

    Coletti, G.
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    Luxembourg, S. L.
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    Geerligs, L. J.
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    Rosca, V.
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    Burgers, A. R.
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    Wu, Y.
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    Okel, L.
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    Kloos, M.
    Journal article
    2020, ACS ENERGY LETTERS, (5) 5, p.1676-1680
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    Single wafer cleaning and drying: particle removal via a non-contact, non-damaging megasonic clean followed by a high performance "Rotagoni" dry

    Lauerhaas, Jeff
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    Mertens, Paul  
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    Fyen, Wim
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    Kenis, Karine  
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    Meuris, Marc  
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    Nicolosi, T.
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    Bran, M.
    Proceedings paper
    2000, Proceedings of the 9th International Symposium on Semiconductor Manufacturing - ISSM, 26/09/2000, p.157-160
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    Sub 100nm particle removal with deionized water and a megasonic frequency of 835kHz

    Lauerhaas, Jeff
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    Wu, Y.
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    Xu, Kaidong
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    Vereecke, Guy  
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    Vos, Rita  
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    Kenis, Karine  
    ;
    Mertens, Paul  
    Proceedings paper
    2002, Cleaning Technology in Semiconductor Device Manufacturing VII, 4/09/2001, p.145-146
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    Sub 100nm particle removal with deionized water and a megasonic frequency of ~835kHz

    Lauerhaas, Jeff
    ;
    Xu, Kaidong
    ;
    Vereecke, Guy  
    ;
    Vos, Rita  
    ;
    Kenis, Karine  
    ;
    Mertens, Paul  
    ;
    Wu, Y.
    Meeting abstract
    2001, 200th International Meeting Electrochemical Society: 7th International Symposium on Cleaning Technology in Semiconductor Device, 2/09/2001

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