Browsing by Author "Yamane, Takeshi"
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Publication ABI tool performance confirmation by NXE3300 printing results for native EUV blank defects at 16nm half pitch
Proceedings paper2016-11, International Symposium on Extreme Ultraviolet Lithography - EUVL, 24/10/2016Publication ABI tool performance confirmed by NXE3300 printing results
Proceedings paper2015-10, EUVL Symposium, 5/10/2015Publication Blank defect coverage budget for 16nm half-pitch single EUV exposure
Proceedings paper2018, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology, 18/04/2018, p.108070HPublication Printability estimation of EUV blank defect using actinic image
Proceedings paper2018, Extreme Ultraviolet (EUV) Lithography IX, 25/02/2018, p.105831F