Browsing by Author "Yan, L."
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Publication 1/f noise study on strained Si0.8Ge0.2 p-channel MOSFETs with high-k/poly Si gate stack
Journal article2009, Solid-State Electronics, (53) 11, p.1177-1182Publication Strained Si/SiGe MOS technology
;Olsen, S. ;Yan, L. ;Agaiby, R. ;Escobedo-Cousin, E. ;O'Neill, A.G. ;Hellstrom, P.-E.Ostling, M.Oral presentation2007, 4th International Symposium on Advanced Gate Stack technologyPublication Strained Si/SiGe MOS technology: improving gate dielectric integrity
;Olsen, S.H. ;Yan, L. ;Agaiby, R. ;Escobedo-Cousin, A.G. ;O'Neil, A.G. ;Hellstrom, P.E.Ostling, M.Journal article2009, Microelectronic Engineering, (86) 3, p.218-223