Publication:
1/f noise study on strained Si0.8Ge0.2 p-channel MOSFETs with high-k/poly Si gate stack
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2067 since deposited on 2021-10-18
Acq. date: 2025-10-23
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2067 since deposited on 2021-10-18
Acq. date: 2025-10-23
Citations