Browsing by Author "Yannuzzi, Jonathan"
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Publication Probabilistic process window: a new approach to focus-exposure analysis
Journal article2023, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (22) 2, p.Art. 021007Publication Probabilistic Process Window: A new approach to focus-exposure analysis
Proceedings paper2022, Conference on Metrology, Inspection, and Process Control XXXVI Part of SPIE Advanced Lithography and Patterning Conference, FEB 24-MAY 27, 2022, p.1205307