Browsing by Author "Yoshida, N."
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Publication Effective work function engineering for aggressively scaled planar and FinFET-based devices with high-k last replacement metal gate technology
; ; ; Proceedings paper2012-09, International Conference on Solid State Devices and Materials - SSDM, 25/09/2012Publication Effective work function engineering for aggressively scaled planar and multi-gate fin field-effect transistor-based devices with high-k last replacement metal gate technology
; ; ; Journal article2013, Japanese Journal of Applied Physics, (52) 4, p.04CA02Publication Si/SiGe superlattice I/O finFETs in a vertically-stacked gate-all-around horizontal nanowire technology
Proceedings paper2018, IEEE Symposium on VLSI Technology, 14/06/2018, p.85-86