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Conference contributions
Si/SiGe superlattice I/O finFETs in a vertically-stacked gate-all-around horizontal nanowire technology
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Si/SiGe superlattice I/O finFETs in a vertically-stacked gate-all-around horizontal nanowire technology
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Date
2018
Proceedings Paper
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Hellings, Geert
;
Mertens, Hans
;
Subirats, Alexandre
;
Simoen, Eddy
;
Schram, Tom
;
Ragnarsson, Lars-Ake
;
Simicic, Marko
;
Chen, Shih-Hung
;
Parvais, Bertrand
;
Boudier, Dimitri
;
Cretu, Bogdan
;
Machillot, Jerome
;
Pena, Vanessa
;
Sun, S.
;
Yoshida, N.
;
Kim, N.
;
Mocuta, Anda
;
Linten, Dimitri
;
Horiguchi, Naoto
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1958
since deposited on 2021-10-25
Acq. date: 2025-12-09
Citations
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Views
1958
since deposited on 2021-10-25
Acq. date: 2025-12-09
Citations