Browsing by Author "Yoshida, Yukifumi"
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Publication Enabling GeH4-HCl in-situ pre-epi clean: impact of water quality on HF last process performance
Meeting abstract2015, E-MRS Fall Symposium: Alternative Semiconductor Integration in Si Microelectronics: Materials, Techniques and Applications, 15/09/2015Publication Impact of hydrogen peroxide in ultrapure water
Publication Pre-Epi Clean of SiGe 20%: GeH4 and HCl vs H2-based in-situ cleaning
Meeting abstract2018-05, 9th International SiGe Technology and Device Meeting / 11th International Conference on Silicon Epitaxy and Heterostructures, 27/05/2018, p.193-194Publication SiGe vs. Si selective wet etchingfor Si gate-all-around
; ; ; Publication Surface preparation and wet cleaning for germanium surface
Proceedings paper2017, IEEE Electron Devices Technology and Manufacturing Conference - EDTM, 28/02/2017, p.160-161