Browsing by Author "Yoshino, Kenji"
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Publication Gate-length dependent radiation damage in 2-MeV electron-irradiated Si1-xGexS/D p-MOSFETs
Journal article2012, Materials Science Forum, 725, p.235-238Publication Increased radiation hardness of short-channel electron-irradiated Si1-xGex source/drain p-type metal oxide semiconductor field-effect transistors at higher Ge content
Journal article2013, Japanese Journal of Applied Physics, (52) 9, p.94201Publication Local compressive stress generation in electron irradiated boron-doped Si0.75Ge0.25/Si devices
;Tsunoda, Isao ;Nakashima, Toshiyuki ;Naka, Noboyuki ;Idemoto, TatsuyaYoneoka, MasahiJournal article2012, Physica Status Solidi C, (9) 10_11, p.2058-2061Publication Radiation tolerance of Si1-yCy source/drain n-MOSFETs with different carbon concentrations
Proceedings paper2013, 8th International conference on Silicon Epitaxy and Heterostructures - ICSI-8, 4/06/2013, p.185-186