Browsing by Author "Zhu, Helen"
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Publication 30-nm half-pitch metal patterning using MotifTM critical dimension shrink technique and double patterning
Journal article2009, Journal of Micro/Nanolithography MEMS MOEMS, (8) 1, p.11007Publication 30nm half-pitch metal patterning using MotifTM CD shrink technique and double patterning
Proceedings paper2008, Optical Microlithography XXI, 24/02/2008, p.69242CPublication A novel plasma-assisted shrink process to enlarge process windows of narrow trenches and contacts for 45-nm node applications and beyond
; ; ; ; Proceedings paper2007, Advances in Resist Materials and Processing Technology XXIV, 25/02/2007, p.65190UPublication Novel patterning shrink technique enabling sub-50nm trench and contact integration
Proceedings paper2007, International Symposium on Semiconductor Manufacturing, 15/10/2007