Browsing by Author "de Rooij-Lohmann, Veronique"
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Publication First results of EUV-scanner compatibility tests performed on novel 'high-NA' reticle absorber materials
Publication Lifetime test on EUV photomask with EBL2
Proceedings paper2019-05, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 16/04/2019, p.111780EPublication Novel metrology for mask degradation: IR-AFM, XPS depth profiling and HAXPES
Publication Study of EUV reticle storage effects through exposure on EBL2 and NXE
Proceedings paper2020, Extreme Ultraviolet Lithography 2020, 21/09/2020, p.115170Z