Browsing by Author "van Dijk, Andre"
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Publication Demonstration of scaled 0.099μm² FinFET 6T-SRAM cell using full-field EUV lithography for (Sub-)22nm node single-patterning technology
Proceedings paper2009-12, IEEE International Electron Devices Meeting - IEDM, 7/12/2009, p.301-304Publication Implementing full field EUV lithography using the ADT
; ; ; ; Proceedings paper2008, International Symposium on Extreme Ultraviolet Lithography - EUVL, 28/09/2008Publication Overlay progress in EUV lithography towards adoption for manufacturing
; ; ; ; ; Voznyi, AlexProceedings paper2011, Extreme Ultraviolet (EUV) Lithography II, 27/02/2011, p.79691MPublication Stability and imaging of the ASML EUV Alpha Demo Tool
; ; ; ; ; Proceedings paper2009, Alternative Lithographic Technologies, 22/02/2009, p.72710TPublication Tomorrow's pitches on today's 0.33 NA scanner: pupil and imaging conditions to print P24 L/S and P28 contact holes
Proceedings paper2020, Extreme Ultraviolet Lithography 2020, 21/09/2020, p.1151716Publication Understanding of Out-of-Band DUV light in EUV lithography: controlling impact on imaging and mitigation strategies
Proceedings paper2015, 31st European Mask and Lithography Conference, 22/06/2015, p.96610BPublication Validation of imaging benefits of Dual Monopole exposures
Proceedings paper2023, International Conference on Extreme Ultraviolet Lithography, OCT 02-05, 2023, p.Art. 1275006