Browsing by Author "van Ingen-Schenau, Koen"
Now showing 1 - 3 of 3
- Results per page
- Sort Options
Publication 22nm node imaging and beyond: a comparison of EUV and ArFi double patterning
Proceedings paper2010, International Symposium on Lithography Extensions, 20/10/2010Publication 22nm node imaging and beyond: When will EUV take over?
Proceedings paper2010, International Symposium on Extreme Ultraviolet Lithography, 18/10/2010Publication Evaluation of resist performance for 22nm half-pitch and beyond using EUV interference lithography
Proceedings paper2010, International Symposium on Extreme Ultraviolet Lithography, 18/10/2010