Browsing by author "Pawlowski, G."
Now showing items 1-4 of 4
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Optimization of an advanced positive DUV photoresist towards 150 nm and beyond
Ercken, Monique; Moelants, Myriam; Vandenberghe, Geert; Goethals, Mieke; Ronse, Kurt; Masuda, Seiya; Spiess, Walter; Pawlowski, G. (1999) -
Optimization of an advanced positive DUV resist for 248 nm L/S pattern printing
Ercken, Monique; Pollers, Ingrid; Van Puyenbroeck, Ilse; Goethals, Mieke; Ronse, Kurt; Pawlowski, G.; Spiess, Walter (1998) -
Optimization of an advanced positive DUV resist for 248 nm L/S pattern printing
Ercken, Monique; Moelants, Myriam; Pollers, Ingrid; Van Puyenbroeck, Ilse; Goethals, Mieke; Ronse, Kurt; Pawlowski, G.; Spiess, Walter (1999) -
Optimization of an advanced positive tone DUV photoresist towards 150nm and beyond
Ercken, Monique; Moelants, Myriam; Vandenberghe, Geert; Goethals, Mieke; Ronse, Kurt; Masuda, Seiya; Spiess, Walter; Pawlowski, G. (2000)