Browsing by author "Sturtevant, John"
Now showing items 1-4 of 4
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Contour-quality assessment for OPC model calibration
Filitchkin, Paul; Do, Thuy; Kusnadi, Ir; Sturtevant, John; De Bisschop, Peter; Van de Kerkhove, Jeroen (2009) -
Effective use of aerial image metrology for calibration of OPC models
Chen, Ao; Foong, Yee Mei; Thaler, Thomas; Buttgereit, Ute; Chung, Angeline; Burbine, Andrew; Sturtevant, John; Clifford, Chris; Adam, Kostas; De Bisschop, Peter (2017) -
High-precision contouring from SEM image in 32-nm lithography and beyond
Shindo, Hiroyuki; Sugiyama, Akiyuki; Komuro, Hitoshi; Hojyo, Yutaka; Matsuoka, Ryoichi; Sturtevant, John; Do, Thuy; Kusnadi, Ir; Fenger, Germain; De Bisschop, Peter; Van de Kerkhove, Jeroen (2009) -
Probability prediction of EUV process failure due to resist-exposure stochastic: applications of Gaussian random fields excursions and Rice's formula
Latypov, Azat; Khaira, Damon; Fenger, Germain; Sturtevant, John; Wei, Chih-I; De Bisschop, Peter (2020)