Browsing by author "Koret, Roy"
Now showing items 1-7 of 7
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Metrology of Thin Resist for High NA EUVL
Lorusso, Gian; Beral, Christophe; Bogdanowicz, Janusz; De Simone, Danilo; Hasan, Mahmudul; Jehoul, Christiane; Moussa, Alain; Saib, Mohamed; Zidan, Mohamed; Severi, Joren; Truffert, Vincent; Van Den Heuvel, Dieter; Goldenshtein, Alex; Houchens, Kevin; Santoro, Gaetano; Fischer, Daniel; Muellender, Angelika; Hung, Joey; Koret, Roy; Turovets, Igor; Ausschnitte, Kit; Mack, Chris; Kondo, Tsuyoshi; Shohjoh, Tomoyasu; Ikota, Masami; Charley, Anne-Laure; Leray, Philippe (2022) -
Plasma halogenated amorphous carbon as growth inhibiting layer for area-selective deposition of titanium oxide
Krishtab, Mikhail; Hung, Joey; Koret, Roy; Turovets, Igor; Shah, Kavita; Rangarajan, Srinivasan; Warad, Laxmi; Zhang, Vanessa; Ameloot, Rob; Armini, Silvia (2020) -
Scatterometry and AFM measurement combination for area selective deposition process characterization
Saib, Mohamed; Moussa, Alain; Charley, Anne-Laure; Leray, Philippe; Hung, Joey; Koret, Roy; Turovets, Igor; Ger, Avron; Deng, Shaoren; Illiberi, Andrea; Maes, Jan Willem; Woodworth, Gabriel; Strauss, Michael (2019) -
Scatterometry and X-ray metrology for in-line control of spin-transfer torque magnetic random access memory (STT-MRAM) devices
Crotti, Davide; Swerts, Johan; Yasin, Farrukh; Jossart, Nico; Souriau, Laurent; Kundu, Shreya; Urenski, Ronen; Urbanowicz, Adam M.; Koret, Roy; Figueiro, Nivea; Sendelbach, Matthew; Lee, Wei Ti; Shah, Kavita; Larson, Tom; Ger, Avron; Wolfling, Shay; Kar, Gouri Sankar (2018) -
Scatterometry solutions for 14nm half-pitch BEOL layers patterned by EUV single exposure
Das, Sayantan; Hung, Joey; Halder, Sandip; Koret, Roy; Turovets, Igor; Charley, Anne-Laure; Leray, Philippe (2021) -
Selectivity process control using in-line XPS for self-assembly monolayer-based selective deposition process
Armini, Silvia; Herregods, Sebastiaan; Tokei, Zsolt; Charley, Anne-Laure; Leray, Philippe; Lee, Wei Ti; Larson, Tom; Figueiro, Nivea; Koret, Roy; Wolfling, Shay (2018) -
Spectroscopy: A new route towards critical-dimension metrology of the cavity etch of nanosheet transistors
Bogdanowicz, Janusz; Oniki, Yusuke; Kenis, Karine; Muraki, Yusuke; Nuytten, Thomas; Sergeant, Stefanie; Franquet, Alexis; Spampinato, Valentina; Conard, Thierry; Hoflijk, Ilse; Meersschaut, Johan; Claessens, Niels; Moussa, Alain; Van Den Heuvel, Dieter; Hung, Joey; Koret, Roy; Charley, Anne-Laure; Leray, Philippe (2021)