Browsing by author "Moguilnikov, Konstantin"
Now showing items 1-7 of 7
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Determination of critical characteristics of low-k films by ellipsometric porosimetry
Baklanov, Mikhaïl; Moguilnikov, Konstantin (2002) -
Determination of Young's Modulus of porous low-k films by ellipsometruc porosimetry
Moguilnikov, Konstantin; Baklanov, Mikhaïl (2002) -
Ellipsometric study of the change in the porosity of silica xerogels after chemical modification of the surface with hexamethyldisilazane
Himcinschi, C.; Friedrich, M.; Frühauf, S.; Streiter, I.; Schulz, S.E.; Gessner, T.; Baklanov, Mikhaïl; Moguilnikov, Konstantin; Zahn, D.R.T. (2002) -
Non-destructive characterisation of porous low-k dielectric films
Baklanov, Mikhaïl; Moguilnikov, Konstantin (2002) -
Porosity in plasma enhanced chemical vapor deposited SiCOH dielectrics: a comparative study
Grill, A.; Patel, V.; Rodbell, K.P.; Huang, E.; Baklanov, Mikhaïl; Moguilnikov, Konstantin; Toney, M.; Kim, H.C. (2003) -
Properties of mesoporous low-k MSSQ based film prepared using macromolecular porogen
Baklanov, Mikhaïl; Jehoul, Christiane; Flannery, C. M.; Moguilnikov, Konstantin; Gore, R.; Gronbeck, D.; Prokopowicz, G.; Sullivan, C.; You, Y.; Pugliano, N.; Gallagher, M. (2002) -
Structural characterization of mesoporous organosilica films for ultralow-k dielectrics
de Theije, F.K.; Balkenende, A.R.; Verheyen, M.A.; Baklanov, Mikhaïl; Moguilnikov, Konstantin; Furukawa, Y. (2003)