Browsing by author "Eurlings, M."
Now showing items 1-4 of 4
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Creative metrology development for EUVL: Flare and out-of-band qualification
Lorusso, Gian; Hendrickx, Eric; Davydova, N.; Peng, Y.; Eurlings, M.; Feenstra, K.; Jiang, J. (2011) -
Development of automatic OPC treatment and layout decomposition for double dipole lithography for low K1-imaging
Chiou, T.-B.; Chen, A.; Hsu, Stephen D.; Eurlings, M.; Hendrickx, Eric (2005) -
Experimental verification of a model based decomposition method for double dipole lithography
Eurlings, M.; Hsu, S.D.; Hendrickx, Eric; op 't Root, W.; Laidig, T.L.; Chiou, T.B.; Chen, A.; Chen, F.; Vandenberghe, Geert; Finders, J. (2004) -
The magnitude of potential exposure-tool-induced critical dimension and overlay errors in double dipole lithography for the 65-nm and 45-nm technology nodes
Chiou, T.B.; Chen, A.C.; Tseng, S.E.; Eurlings, M.; Hendrickx, Eric; Hsu, S. (2004)