Authors

Chiou, T.B.; Chen, A.C.; Tseng, S.E.; Eurlings, M.; Hendrickx, Eric; Hsu, S.

Issue

6B

Journal

Japanese Journal of Applied Physics. Part 1: Regular Papers

Volume

43

Title

The magnitude of potential exposure-tool-induced critical dimension and overlay errors in double dipole lithography for the 65-nm and 45-nm technology nodes

Publication type

Journal article