Repository logo Institutional repository
  • Communities & Collections
  • Scientific publicationsOpen knowledge
Search repository
High contrast
  1. Home
  2. The magnitude of potential exposure-tool-induced critical dimension and overlay errors in double dipole lithography for the 65-nm and 45-nm technology nodes
  3. Statistics

Statistics by Category

Reports

  • Most viewed
  • Most viewed per month
  • Top city views
  • File Visits
Item Views
The magnitude of potential exposure-tool-induced critical dimension and overlay errors in double dipole lithography for the 65-nm and 45-nm technology nodes 1347

Follow imec on

VimeoLinkedInFacebook

The repository

  • Contact us
  • Policy
  • About imec
Privacy statement | Cookie settings