Browsing by author "Mailfert, Julien"
Now showing items 1-9 of 9
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3D Mask modeling for EUV lithography
Mailfert, Julien; Zuniga, Christian; Philipsen, Vicky; Adam, Konstantinos; Lam, Michael; Word, James; Hendrickx, Eric; Vandenberghe, Geert; Smith, Bruce (2012) -
A fast triple patterning solution with fix guidance
Fang, Weiping; Arikati, Srini; Celingir, Erdem; Hug, Marco A.; De Bisschop, Peter; Mailfert, Julien; Lucas, Kevin; Gao, Weimin (2014) -
Contour-based metrology for complex 2D shaped patterns printed by multiple-patterning process
Fuchimoto, Daisuke; Ishimoto, Toru; Hiroyuki, Shindo; Sugahara, Hitoshi; Toyoda, Yasutaka; Mailfert, Julien; De Bisschop, Peter (2014) -
Design-based metrology: beyond CD/EPE metrics to evaluate printability performance
Halder, Sandip; Mailfert, Julien; Leray, Philippe; Rio, David; Peng, Hsin-Ying; Laenens, Bart (2016) -
Experimental validation of rigorous, 3D profile models for negative-tone develop resists
Gao, Weimin; Klostermann, Ulrich; Kamohara, Itaru; Schmoeller, Thomas; Lucas, Kevin; Demmerle, Wolfgang; De Bisschop, Peter; Mailfert, Julien (2014) -
Impact of stochastic effects on EUV printability limits
De Bisschop, Peter; Van de Kerkhove, Jeroen; Mailfert, Julien; Vaglio Pret, Alessandro; Biafore, John (2014) -
Influence of surface energy modification in grapho-epitaxy DSA
Doise, Jan; Mailfert, Julien; Bekaert, Joost; Chan, BT; Lin, Guanyang; Gronheid, Roel (2015) -
Metal1 patterning study for randon-logic applications with 193i, using calibrated OPC for litho and etch
Mailfert, Julien; Van de Kerkhove, Jeroen; De Bisschop, Peter; De Meyer, Kristin (2014) -
Optimum ArFi laser bandwidth for10nm node logic imaging performance
Alagna, Paolo; Zurita, Omar; Timoshkov, Vadim; Wong, Patrick; Rechtsteiner, Gregory; Baselmans, Jan; Mailfert, Julien (2015)