Browsing by author "Kearney, Patrick"
Now showing items 1-3 of 3
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Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks
Wood, Obert; Raghunathan, Sudhar; Mangat, Pawitter; Philipsen, Vicky; Luong, Vu; Kearney, Patrick; Verduijn, Erik; Kumar, Aditya; Patil, Suraj; Laubis, Christian; Soltwisch, Victor; Scholze, Frank (2015) -
Driving the industry towards a consensus on high numerical aperture (High-NA) extreme ultraviolet (EUV)
Kearney, Patrick; Wood, Obert; Hendrickx, Eric; McIntyre, Greg; Soichi, Inoue; Goodwin, Frank; Wurm, Stephan; Van Schoot, Jan; Kaiser, Winfried (2014) -
Improved Ru/Si multilayer reflective coatings for advanced extreme-ultraviolet lithography photomasks
Wood, Obert; Wong, Keith; Parks, Valentin; Kearney, Patrick; Meyer-Ilse, Julia; Luong, Vu; Philipsen, Vicky; Faheem, Mohammad; Liang, Yifan; Kumar, Ajay; Chen, Esther; Bennett, Corbin; Bianzhu, Fu; Gribelyuk, Michael; Zhao, Wayne; Mangat, Pawitter; van der Heide, Paul (2016)