Browsing by author "Raghunathan, Sudhar"
Now showing items 1-5 of 5
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A method of image-based aberration metrology for EUVL tools
Levinson, Zac; Raghunathan, Sudhar; Verduijn, Erik; Wood, Obert; Mangat, Pawitter; Goldberg, Kenneth; Benk, Markus; Wojdyla, Antoine; Philipsen, Vicky; Hendrickx, Eric; Smith, Bruce (2015) -
Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks
Wood, Obert; Raghunathan, Sudhar; Mangat, Pawitter; Philipsen, Vicky; Luong, Vu; Kearney, Patrick; Verduijn, Erik; Kumar, Aditya; Patil, Suraj; Laubis, Christian; Soltwisch, Victor; Scholze, Frank (2015) -
Characterization of telecentricity errors in high-numerical-aperture extreme ultraviolet mask images
Raghunathan, Sudhar; Wood, Obert; Mangat, Pawitter; Verduijn, Erik; Philipsen, Vicky; Hendrickx, Eric; Jonckheere, Rik; Goldberg, Ken; Benk, Marcus; Kearney, Pat; Levinson, Zachary; Smith, Bruce (2014) -
Imaging impact of multilayer tuning in EUV masks, experimental validation
Philipsen, Vicky; Hendrickx, Eric; Verduijn, Erik; Raghunathan, Sudhar; Wood, Obert; Soltwisch, Victor; Scholze, Frank; Davydova, Natalia; Mangat, Pawitter (2014) -
Improving EUV imaging at tighter pitch using a tuned-ML mask stack
Wood, Obert; Philipsen, Vicky; Soltwisch, Victor; Raghunathan, Sudhar; Verduijn, Erik; Hendrickx, Eric; Scholze, Frank; Mangat, Pawitter (2014)