Browsing by author "Martin, Patrick"
Now showing items 1-6 of 6
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Heated implantation with amorphous carbon CMOS mask for scaled FinFETs
Togo, Mitsuhiro; Sasaki, Yuichiro; Zschaetzsch, Gerd; Boccardi, Guillaume; Ritzenthaler, Romain; Lee, Jae Woo; Khaja, Fareen; Colombeau, Benjamin; Godet, Ludovic; Martin, Patrick; Brus, Stephan; Altamirano Sanchez, Efrain; Mannaert, Geert; Dekkers, Harold; Hellings, Geert; Horiguchi, Naoto; Vandervorst, Wilfried; Thean, Aaron (2013) -
Impact of AAPSM etch depth linearity in ArF immersion lithography
Cangemi, Michael; Philipsen, Vicky; Leunissen, Peter; De Ruyter, Rudi; Jonckheere, Rik; Martin, Patrick; Wakefield, Clare; Buxbaum, Alex; Morisson, Troy (2005) -
Improved sidewall doping with small implant angle by AsH3 Ion assisted deposition and doping process for scaled NMOS Si bulk FinFETs
Sasaki, Yuichiro; Godet, Ludovic; Chiarella, Thomas; Brunco, David; Rockwell, Tyler; Lee, Jae Woo; Colombeau, Benjamin; Togo, Mitsuhiro; Chew, Soon Aik; Zschaetzsch, Gerd; Noh, Kyung Bong; De Keersgieter, An; Boccardi, Guillaume; Kim, Min-Soo; Hellings, Geert; Martin, Patrick; Vandervorst, Wilfried; Thean, Aaron; Horiguchi, Naoto (2013) -
Mask blank stress birefringence requirements for hyper-NA lithography
Leunissen, Peter; Philipsen, Vicky; De Ruyter, Rudi; Demarteau, M.; van de Kerkhof, M.; de Boeij, Wim; Waelpoel, J.; Martin, Patrick; Cangemi, Michael (2005) -
The impact of mask birefringence on hyper-NA (NA>1.0) polarized imaging
Geh, Bernd; Flagello, Donis; Progler, Chris; Martin, Patrick; Leunissen, Peter; Hansen, Steve; De Boeij, Wim (2005) -
Through-pitch characterization and printability for 65nm half-pitch alternating aperture phase shift applications
Philipsen, Vicky; Leunissen, Peter; De Ruyter, Rudi; Jonckheere, Rik; Martin, Patrick; Wakefield, Clare; Johnson, Stephen; Cangemi, Mike; Buxbaum, Alex; Morrison, Troy (2005)