Browsing by author "Verhaegen, Staf"
Now showing items 41-48 of 48
-
Physical design and mask synthesis considerations for DPT
Lucas, Kevin; Cork, Chris; Hapli, John; Miloslavsky, Alex; Wiaux, Vincent; Verhaegen, Staf (2008) -
Physical design and mask synthesis considerations for DPT
Lucas, Kevin; Cork, Chris; Hapli, John; Miloslavsky, Alex; Wiaux, Vincent; Verhaegen, Staf (2008) -
Printability verification for double-patterning technology
Luk-Pat, Gerard; Panaite, Petrisor; Lucas, Kevin; Cork, Christopher; Wiaux, Vincent; Verhaegen, Staf; Maenhoudt, Mireille (2008) -
RET imaging capbility with 0.85NA ArF immersion lithography
Wiaux, Vincent; Hendrickx, Eric; Bekaert, Joost; Vandeweyer, Tom; Van Look, Lieve; Verhaegen, Staf; Vandenberghe, Geert (2005) -
Reticle quality needs for advanced 193 nm lithography
Jonckheere, Rik; Vandenberghe, Geert; Wiaux, Vincent; Verhaegen, Staf; Ronse, Kurt (2001) -
Split and design guidelines for double patterning
Wiaux, Vincent; Verhaegen, Staf; Cheng, Shaunee; Iwamoto, Fumio; Jaenen, Patrick; Maenhoudt, Mireille; Matsuda, Takashi; Postnikov, Sergey; Vandenberghe, Geert (2008) -
Three litho-process-litho approaches for 2D double patterning at the 32nm half pitch node
Wong, Patrick; Gronheid, Roel; Wiaux, Vincent; Vaglio Pret, Alessandro; Verhaegen, Staf; Vandenbroeck, Nadia (2010) -
Towards 26nm hp: advances in litho-process-litho
Wong, Patrick; Vangoidsenhoven, Diziana; Murdoch, Gayle; Maenhoudt, Mireille; Verhaegen, Staf; Wiaux, Vincent (2009)