Browsing by author "Verhaegen, Staf"
Now showing items 21-40 of 48
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Feasibility of printing 0.1μm technology with optical lithography
Maenhoudt, Mireille; Verhaegen, Staf; Ronse, Kurt; Flagello, D.; Geh, B.; Kaiser, W. (1999) -
Freeform illumination sources: an experimental study of source-mask optimization for 22nm SRAM cells
Bekaert, Joost; Laenens, Bart; Verhaegen, Staf; Van Look, Lieve; Trivkovic, Darko; Lazzarino, Frederic; Vandenberghe, Geert; Van Adrichem, Paul; Socha, Robert; Baron, S.; Tsai, M.-C.; Ning, K.; Hsu, S.; Liu, H.Y.; Mulder, M.; Bouma, A.; van der Heijden, E.; Mouraille, O.; Schreel, K.; Finders, Jo; Dusa, Mircea; Zimmerman, J.; Graeupner, Paul; Neumann, J.T.; Hennerkes, C. (2010) -
Freeform illumination sources: Source mask optimization for 22 nm node SRAM
Bekaert, Joost; Laenens, Bart; Verhaegen, Staf; Van Look, Lieve; Trivkovic, Darko; Lazzarino, Frederic; Vandenberghe, Geert; Van Adrichem, Paul; Socha, Robert; Mulder, M.; Baron, Stanislas; Tsai, Min-Chun; Ning, Kai; Hsu, Stephen; Bouma, A.; van der Heijden, E.; Schreel, Koen; Carpaij, R.; Dusa, Mircea; Zimmerman, Joerg; Graeupner, Paul; Hennerkes, Christoph (2009) -
Full-field EUV and immersion lithography integration in 0.186μm² FinFET 6T-SRAM cell
Veloso, Anabela; Demuynck, Steven; Ercken, Monique; Goethals, Mieke; Demand, Marc; de Marneffe, Jean-Francois; Altamirano Sanchez, Efrain; De Keersgieter, An; Delvaux, Christie; De Backer, Johan; Brus, Stephan; Hermans, Jan; Baudemprez, Bart; Van Roey, Frieda; Lorusso, Gian; Baerts, Christina; Goossens, Danny; Vrancken, Christa; Mertens, Sofie; Versluijs, Janko; Truffert, Vincent; Huffman, Craig; Laidler, David; Heylen, Nancy; Ong, Patrick; Parvais, Bertrand; Rakowski, Michal; Verhaegen, Staf; Hikavyy, Andriy; Meiling, H.; Hultermans, B.; Romijn, L.; Pigneret, C.; Lok, S.; Van Dijk, A.; Shah, K.; Noori, A.; Gelatos, J.; Arghavani, R.; Schreutelkamp, Rob; Boelen, Pieter; Richard, Olivier; Bender, Hugo; Witters, Liesbeth; Collaert, Nadine; Rooyackers, Rita; Absil, Philippe; Lauwers, Anne; Jurczak, Gosia; Hoffmann, Thomas Y.; Vanhaelemeersch, Serge; Cartuyvels, Rudi; Ronse, Kurt; Biesemans, Serge (2008) -
High yield sub-0.1μm² 6T-SRAM Cells, featuring high-k/metal-gate Finfet devices, double gate patterning, a novel Fin etch strategy, full-field EUV lithography and optimized junction design & layout
Horiguchi, Naoto; Demuynck, Steven; Ercken, Monique; Locorotondo, Sabrina; Lazzarino, Frederic; Altamirano Sanchez, Efrain; Huffman, Craig; Brus, Stephan; Demand, Marc; Struyf, Herbert; De Backer, Johan; Hermans, Jan; Delvaux, Christie; Vandeweyer, Tom; Baerts, Christina; Mannaert, Geert; Truffert, Vincent; Verluijs, j; Alaerts, Wilfried; Dekkers, Harold; Ong, Patrick; Heylen, Nancy; Kellens, Kristof; Volders, Henny; Hikavyy, Andriy; Vrancken, Christa; Rakowski, Michal; Verhaegen, Staf; Vandenberghe, Geert; Beyer, Gerald; Lauwers, Anne; Absil, Philippe; Hoffmann, Thomas Y.; Ronse, Kurt; Biesemans, Serge (2010) -
Immersion lithography and double patterning in advanced microelectronics
Vandeweyer, Tom; Bekaert, Joost; Ercken, Monique; Gronheid, Roel; Miller, Andy; Truffert, Vincent; Verhaegen, Staf; Versluijs, Janko; Wiaux, Vincent; Wong, Patrick; Vandenberghe, Geert; Maenhoudt, Mireille (2010) -
Incorporating more in-depth radiation knowledge in the DARE180U analog design kit
Verhaegen, Staf; Sijbers, Wim; Zagrocki, Stephane; Berti, Laurent; Wouters, Jan; Franciscatto, Giancarlo; Thys, Geert; Redant, Steven; Glass, Boris; Jansen, Richard (2016) -
Integration of tall triple-gate devices with inserted TaxNy gate in a 0.274μm² 6T-SRAM cell and advanced CMOS logic circuits
Witters, Liesbeth; Collaert, Nadine; Nackaerts, Axel; Demand, Marc; Demuynck, Steven; Delvaux, Christie; Lauwers, Anne; Baerts, Christina; Beckx, Stephan; Boullart, Werner; Brus, Stephan; Degroote, Bart; de Marneffe, Jean-Francois; Dixit, Abhisek; De Meyer, Kristin; Ercken, Monique; Goodwin, Michael; Hendrickx, Eric; Heylen, Nancy; Jaenen, Patrick; Laidler, David; Leray, Philippe; Locorotondo, Sabrina; Maenhoudt, Mireille; Moelants, Myriam; Pollentier, Ivan; Ronse, Kurt; Rooyackers, Rita; Van Aelst, Joke; Vandenberghe, Geert; Vandeweyer, Tom; Vanhaelemeersch, Serge; Van Hove, Marleen; Van Olmen, Jan; Verhaegen, Staf; Versluijs, Janko; Vrancken, Christa; Wiaux, Vincent; Willems, Patrick; Wouters, Johan M. D.; Jurczak, Gosia; Biesemans, Serge (2005) -
Interactions of double patterning technology with wafer processing, OPC and design flows
Lucas, Kevin; Cork, Chris; Miloslavsky, Alex; Luk-Pat, Gerry; Barnes, Levi; Hapli, John; Lewellen, John; Rollins, Greg; Wiaux, Vincent; Verhaegen, Staf (2008) -
Joint-optimization for SRAM and Logic for 28nm node and below
Verhaegen, Staf; Smayling, Michael C.; De Bisschop, Peter; Laenens, Bart (2010) -
Limits of optical lithography
Maenhoudt, Mireille; Verhaegen, Staf; Ronse, Kurt; Zandbergen, Peter; Muzio, E. (2000) -
Litho enhancements for 45nm-node MuGFETs
Verhaegen, Staf; Ercken, Monique; Nackaerts, Axel; Vandenberghe, Geert (2005) -
Litho variations and their impact on the electrical yield of a 32nm node 6T-SRAM cell
Verhaegen, Staf; Cosemans, Stefan; Dusa, Mircea; Marchal, Pol; Nackaerts, Axel; Vandenberghe, Geert; Dehaene, Wim (2008-02) -
Litho-process-litho for 2D 32nm hp LOGIC and DRAM double patterning
Wong, Patrick; Wiaux, Vincent; Verhaegen, Staf; Vandenbroeck, Nadia (2010) -
Lithography and yield sensitivity analysis of SRAM scaling for the 32-nm node.
Nackaerts, Axel; Verhaegen, Staf; Dusa, Mircea; Kattouw, Hans; van Bilsen, Frank; Biesemans, Serge; Vandenberghe, Geert (2007) -
Meeting double patterning challenges: from split to process control
Wiaux, Vincent; Cheng, Shaunee; Maenhoudt, Mireille; Storms, Greet; Vandenberghe, Geert; Verhaegen, Staf (2007) -
Model based OPC for 1st generation 193-nm lithography
Lucas, Kevin; Word, James; Vandenberghe, Geert; Verhaegen, Staf; Jonckheere, Rik (2001) -
OPC aware mask and wafer metrology
Maurer, Wilhelm; Wiaux, Vincent; Jonckheere, Rik; Philipsen, Vicky; Hoffmann, Thomas; Verhaegen, Staf; Ronse, Kurt; England, Jonathan G.; Howard, William B. (2002) -
Optical extensions integration for a 0.314-μm² 45-nm node 6-transistor SRAM cell
Verhaegen, Staf; Nackaerts, Axel; Wiaux, Vincent; Hendrickx, Eric; Vandenberghe, Geert (2005) -
Patterning challenges in setting up a 16nm node 6T-SRAM device using EUV lithography
Vandeweyer, Tom; De Backer, Johan; Versluijs, Janko; Truffert, Vincent; Verhaegen, Staf; Ercken, Monique; Dusa, Mircea (2011)