Browsing by author "De Ruyter, Rudi"
Now showing items 1-6 of 6
-
Assessment of EUV reticle blank availability enabling the use of EUV tools today and in the future
Jonckheere, Rik; Lorusso, Gian; Goethals, Mieke; Ronse, Kurt; Hermans, Jan; De Ruyter, Rudi (2007) -
EUV single patterning for logic metal layers: achievement and challenge
Kim, Ryan Ryoung han; Gillijns, Werner; Drissi, Youssef; Trivkovic, Darko; Blanco, Victor; Lariviere, Stephane; De Ruyter, Rudi; Dehan, Morin; McIntyre, Greg; Tan, Ling Ee (2017) -
Impact of AAPSM etch depth linearity in ArF immersion lithography
Cangemi, Michael; Philipsen, Vicky; Leunissen, Peter; De Ruyter, Rudi; Jonckheere, Rik; Martin, Patrick; Wakefield, Clare; Buxbaum, Alex; Morisson, Troy (2005) -
Mask blank stress birefringence requirements for hyper-NA lithography
Leunissen, Peter; Philipsen, Vicky; De Ruyter, Rudi; Demarteau, M.; van de Kerkhof, M.; de Boeij, Wim; Waelpoel, J.; Martin, Patrick; Cangemi, Michael (2005) -
Pushing the boundaries of EUV scatterometry: reconstruction of complex nanostructures for next-generation transistor technology
Ciesielski, Richard; Lohr, Leonhard M.; Mertens, Hans; Charley, Anne-Laure; de Ruyter, Rudi; Bogdanowicz, Janusz; Hoenicke, Philipp; Abbasirad, Najmeh; Soltwisch, Victor (2023) -
Through-pitch characterization and printability for 65nm half-pitch alternating aperture phase shift applications
Philipsen, Vicky; Leunissen, Peter; De Ruyter, Rudi; Jonckheere, Rik; Martin, Patrick; Wakefield, Clare; Johnson, Stephen; Cangemi, Mike; Buxbaum, Alex; Morrison, Troy (2005)