Browsing by author "Oak, Apoorva"
Now showing items 1-6 of 6
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28nm pitch single exposure patterning readiness by metal oxide resist on 0.33NA EUV Lithography
Kim, Il Hwan; Kim, Insung; Park, Changmin; Lee, Jsiun; Ryu, Koungmin; De Schepper, P.; Doise, J.; Kocsis, M.; De Simone, Danilo; Kljucar, Luka; Das, Poulomi; Blanc, Romuald; Beral, Christophe; Severi, Joren; Vandenbroeck, Nadia; Foubert, Philippe; Charley, Anne-Laure; Oak, Apoorva; Xu, Dongbo; Gillijns, Werner; Mitard, Jerome; Tokei, Zsolt; van der Veen, Marleen; Heylen, Nancy; Teugels, Lieve; Le, Quoc Toan; Schleicher, Filip; Leray, Philippe; Ronse, Kurt (2021) -
Curvilinear Standard Cell Design for Semiconductor Manufacturing
Kim, Ryan Ryoung han; Hwang, Soobin; Oak, Apoorva; Sherazi, Yasser; Chang, Hsinlan; Yang, Kiho; Mirabelli, Gioele (2024) -
EUV Single Patterning Exploration for Pitch 28 nm
Xu, Dongbo; Gillijns, Werner; Drissi, Youssef; Tan, Ling Ee; Oak, Apoorva; Kim, Ryan Ryoung han (2021-02-22) -
Machine learning based recursive partitioning for simplifying OPC model building complexity
Oak, Apoorva; Hwang, Soobin; Chen, Ruoxia; Kang, Shinill; Kim, Ryan Ryoung han (2021) -
Manufacturing-friendly curvilinear standard cell design
Kim, Ryan Ryoung han; Oak, Apoorva; Sherazi, Yasser; Mirabelli, Gioele; Hwang, Soobin; Yang, Kiho; Chang, Hsinlan (2024) -
Study of EUV stochastic defect on wafer yield
Tsai, Yi-Pei; Chang, Chieh-Miao; Chang, Yi-Han; Oak, Apoorva; Trivkovic, Darko; Kim, Ryan Ryoung han (2024)